Optical element for correction of aberration, and a lithographic apparatus comprising same
US7715107B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Apr 25, 2006 |
| Grant date | May 11, 2010 |
| Priority date | — |
| Expiry date | Jan 8, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70266
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical element for correcting aberrations in an optical apparatus has a casing. The casing is filled with liquid and has a support layer and a cover layer designed to pass light of a predetermined wavelength range. The casing accommodates several actuators. Each actuator has a first end supporting the cover layer and a second end supporting the support layer. Each actuator is able to locally change a local distance between the support layer and the cover layer to correct for local aberrations in a light beam directed to the optical element by providing local phase shifts. The optical element may be used in a lithographic apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.