Patent · US Active

System and method for estimating the crystallinity of stacked metal lines in microstructures

US7718447B2 · kind B2 · utility

1Cited by

10References

21Claims

0Family size

Assignee

Advanced Micro Devices, Inc. · US

Inventors

Inka Zienert · Dresden, DE
Moritz Andreas Meyer · Pulheim, DE
Hartmut Prinz · Dresden, DE

Key dates

Filing date	Oct 17, 2006
Grant date	May 18, 2010
Priority date	—
Expiry date	Oct 10, 2028

Classification

Technology area (CPC G)Physics
CPC primaryG01N23/207
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

By performing x-ray analysis of stacked metallization layers on the basis of data reduction, the crystalline structure of individual metallization layers may be determined. Consequently, a relationship between electromigration and crystallinity, as well as a correlation between process parameters and materials and the finally obtained crystalline structures of metal lines, may be estimated in a highly efficient manner compared to measurement techniques based on charged particles.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.