Beam processing system and beam processing method
US7718980B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 30, 2007 |
| Grant date | May 18, 2010 |
| Priority date | — |
| Expiry date | Nov 5, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/30483
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A beam processing system is for causing a particle beam extracted from a beam generating source to pass through a mass analysis magnet device, a mass analysis slit, and a deflection scanner in the order named, thereby irradiating the particle beam onto a processing object. The mass analysis slit is installed between the mass analysis magnet device and the deflection scanner at a position where the particle beam having passed through the mass analysis magnet device converges most in a lateral direction. A first DC quadrupole electromagnet and a second DC quadrupole electromagnet are installed on an upstream side and a downstream side of the mass analysis slit, respectively.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.