Illumination optical apparatus, exposure apparatus, and method for producing device
US7719661B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 18, 2008 |
| Grant date | May 18, 2010 |
| Priority date | — |
| Expiry date | Nov 18, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70908
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An illumination optical apparatus which illuminates an illumination objective surface with an exposure light includes: an illumination optical system having a curved mirror and a concave mirror and defining a position substantially conjugate with the illumination objective surface between the curved and concave mirrors; and a second aperture plate separating a space in which the curved mirror is arranged and a space in which the concave mirror is arranged into mutually different vacuum environments or pressure-reduced environments, and having an aperture through which the exposure light passes, the aperture being arranged at a position at which a cross-sectional area of the exposure light is smallest, or in the vicinity of the position. It is possible to decrease the amount of passage of minute particles such as debris in relation to any downstream-side optical system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.