Methods and apparatus for sensing unconfinement in a plasma processing chamber
US7722778B2 · kind B2 · utility
9Cited by
11References
22Claims
0Family size
Assignee
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Key dates
| Filing date | Jun 28, 2006 |
| Grant date | May 25, 2010 |
| Priority date | — |
| Expiry date | Jul 23, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67253
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Universal plasma unconfinement detection systems configured to detect the plasma unconfinement condition in the plasma processing chamber and methods therefor. The detection systems and methods are designed to reliably and accurately detect the existence of the plasma unconfinement condition in a process-independent and recipe-independent manner.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.