Substrate holding apparatus, and inspection or processing apparatus
US7723709B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 30, 2007 |
| Grant date | May 25, 2010 |
| Priority date | — |
| Expiry date | Oct 12, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68728
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.