Patent · US Active

Lithographic apparatus, device manufacturing method and exchangeable optical element

US7724351B2 · kind B2 · utility

6Cited by

0References

34Claims

0Family size

Assignees

ASML NETHERLANDS B.V. · NL
Carl Zeiss SMT GmbH · DE

Inventors

Erik Roelof Loopstra · Geldrop, NL
Adrianus Franciscus Petrus Engelen · Waalre, NL
Bernardus Antonius Johannes Luttikhuis · Nuenen, NL
Maria Johanna Agnes Rubingh · Eindhoven, NL
Johannes Martinus Andreas Hazenberg · Wijchen, NL
Laurentius Catrinus Jorritsma · Helmond, NL
Johannes Wilhelmus De Klerk · Eindhoven, NL
Bernhard Geuppert · Lauchheim, DE
Aart Adrianus Van Beuzekom · Eindhoven, NL
Petrus Franciscus Wilhelmus Maria Mandigers · Valkenswaard, NL
Franz Sorg · Aalen, DE
Peter Deufel · Oberkochen, DE
Peter Schaap · Eindhoven, NL

Key dates

Filing date	Jan 30, 2006
Grant date	May 25, 2010
Priority date	—
Expiry date	Feb 1, 2028

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70933
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A lithographic apparatus has an assembly to exchange optical elements in a pupil plane of its projection system. The optical elements may be pupil filters and may conform to the physical dimensions specified for a reticle standard, e.g. having sides substantially equal to 5, 6 or 9 inches.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.