Movable radiant heat sources
US7725012B2 · kind B2 · utility
371Cited by
12References
32Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 19, 2007 |
| Grant date | May 25, 2010 |
| Priority date | — |
| Expiry date | Aug 16, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67115
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A semiconductor processing apparatus including a processing chamber and a plurality of radiant heat sources. The radiant heat sources heat a workpiece within the chamber. At least one of the radiant heat sources is movable during processing in an oscillatory motion along a path less than about 10 mm from a geometric center of the oscillatory motion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.