Determining profile parameters of a structure using approximation and fine diffraction models in optical metrology
US7729873B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 28, 2007 |
| Grant date | Jun 1, 2010 |
| Priority date | — |
| Expiry date | Jul 17, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70625
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Provided is a method for determining one or more profile parameters of a structure using an optical metrology model, the optical metrology model comprising a profile model, an approximation diffraction model, and a fine diffraction model. A simulated approximation diffraction signal is generated based on an approximation diffraction model of the structure. A set of difference diffraction signals is obtained by subtracting the simulated approximation diffraction signal from each of simulated fine diffraction signals and paired with the corresponding profile parameters and used to generate a library of difference diffraction signals. A measured diffraction signal adjusted by the simulated approximation diffraction signal is matched against the library to determine at least one profile parameter of the structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.