Method of producing a porous dielectric element and corresponding dielectric element
US7732348B2 · kind B2 · utility
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3References
13Claims
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Key dates
| Filing date | Dec 3, 2007 |
| Grant date | Jun 8, 2010 |
| Priority date | — |
| Expiry date | Mar 24, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A porous dielectric element is produced by forming a first dielectric and a second dielectric. The second dielectric is dispersed in the first dielectric. The second dielectric is then removed from the second dielectric by using a chemical dissolution. The removal of the second dielectric from the first dielectric leaves pores in the first dielectric. The pores, which are filled with air, improves the overall dielectric constant of the resulting dielectric element.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.