Apparatus for wafer level arc detection at an RF bias impedance match to the pedestal electrode
US7733095B2 · kind B2 · utility
1Cited by
12References
20Claims
0Family size
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Key dates
| Filing date | Aug 15, 2007 |
| Grant date | Jun 8, 2010 |
| Priority date | — |
| Expiry date | Mar 30, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32944
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Wafer level arc detection is provided in a plasma reactor using an RF transient sensor coupled to a threshold comparator, and a system controller responsive to the threshold comparator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.