Patent · US Active

Lid edge capping load

US7733655B2 · kind B2 · utility

9Cited by
17References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 22, 2008
Grant dateJun 8, 2010
Priority date
Expiry dateSep 23, 2028

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T29/4913
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A method attaches a semiconductor chip to a substrate, applies a thermal interface material to a top of the semiconductor chip, and positions a lid over the semiconductor chip typically attached to the substrate with an adhesive. The method applies a force near the distal ends of the lid or substrate to cause a center portion of the lid or substrate to bow away from the semiconductor chip and increases the central thickness of the thermal interface material prior to curing. While the center portion of the lid or substrate is bowed away from the semiconductor chip, the thermal interface material method increases the temperature of the assembly, thus curing the thermal interface material and lid adhesive. After the thermal interface material has and adhesive have cured, the method removes the force from near the distal ends of the lid or substrate to cause the center portion of the lid to return to a position closer to the semiconductor chip, creating a residual compressive stress in the thermal interface material thus improving thermal performance and thermal reliability.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.