Optimized mirror design for optical direct write
US7738078B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 27, 2007 |
| Grant date | Jun 15, 2010 |
| Priority date | — |
| Expiry date | Oct 26, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70283
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides an optimized direct write lithography system using optical mirrors. That is, a maskless lithography system is provided. The maskless direct-write lithography system provided uses an array of mirrors configured to operate in a tilting mode, a piston-displacement mode, or both in combination. The controlled mirror array is used as a substitute for the traditional chrome on glass masks. In order to avoid constraining the system to forming edges of patterns aligned with the array of mirrors, gray-scale techniques are used for subpixel feature placement. The direct-writing of a pattern portion may rely on a single mirror mode or a combination of modes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.