Plasma treatment between deposition processes
US7741144B2 · kind B2 · utility
8Cited by
127References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 31, 2008 |
| Grant date | Jun 22, 2010 |
| Priority date | — |
| Expiry date | Oct 31, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Embodiments of the present invention include an improved method of forming a thin film solar cell device using a plasma processing treatment between two or more deposition steps. Embodiments of the invention also generally provide a method and apparatus for forming the same. The present invention may be used to advantage to form other single junction, tandem junction, or multi-junction solar cell devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.