Methods and apparatus for temperature measurement and control on a remote substrate surface
US7744274B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 20, 2007 |
| Grant date | Jun 29, 2010 |
| Priority date | — |
| Expiry date | Jul 19, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J2005/202
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Provided is an apparatus for substrate processing. The apparatus may include a radiation source emitting a photonic beam, an optical system to form a beam image, a scanning stage, a temperature monitoring means, an output signal generator that compares the monitored temperature with a preset temperature, and a controller coupled to the radiation source and the stage. The stage may be adapted to scan the substrate so the beam image heats a region of the substrate surface, and the temperature monitoring means may collect and analyzes p-polarized radiation of at least three different spectral regions emitted from one or more places on the heated substrate region. The controller in response to a temperature error signal may be programmed to alter the beam intensity and/or to provide changes in the scanning velocity between the stage and the beam. Other apparatuses and temperature monitoring systems are provided as well.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.