Apparatus for and method of thermophoretic protection of an object in a high-vacuum environment
US7745079B2 · kind B2 · utility
8Cited by
4References
13Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 9, 2006 |
| Grant date | Jun 29, 2010 |
| Priority date | — |
| Expiry date | Apr 29, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70916
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Embodiments disclosed herein relate to an apparatus for and method of protecting a reticle in a lithography system from particle deposition using thermophoresis, but still allowing a high vacuum area for the photo-optics.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.