System with multi-location arc threshold comparators and communication channels for carrying arc detection flags and threshold updating
US7750644B2 · kind B2 · utility
2Cited by
12References
14Claims
0Family size
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Key dates
| Filing date | Aug 15, 2007 |
| Grant date | Jul 6, 2010 |
| Priority date | — |
| Expiry date | Feb 27, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3299
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma reactor system for processing a wafer in which respective comparators are coupled to the respective RF transient sensors which are coupled in turn to respective RF power application points. The comparators have respective comparison thresholds. The system further includes a controller programmed to updating the respective thresholds of the comparators with respective updated thresholds for different ones of the steps of the process recipe.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.