Resist protective film composition and patterning process
US7759047B2 · kind B2 · utility
29Cited by
3References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 14, 2007 |
| Grant date | Jul 20, 2010 |
| Priority date | — |
| Expiry date | May 14, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0046
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
There is disclosed a resist protective film composition for forming a protective film on a photoresist film, comprising: at least
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.