Reflecting optical element with eccentric optical passageway

US7760327B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Hans-Jürgen Scherle · Aalen, DE
• Yim-Bun Patrick Kwan · Aalen, DE
• Stefan Xalter · Oberkochen, DE
• Johannes Lippert · Buch am Wald, DE
• Ulrich Weber · Ulm, DE
• Bernhard Geuppert · Lauchheim, DE
• Bernhard Gellrich · Aalen, DE
• Jens Kugler · Heubach, DE
• Franz Sorg · Aalen, DE
• Willi Heintel · Aalen, DE
• Harald Kirchner · Munich, DE
• Wolfgang Keller · Munich, DE
• Andreas Frommeyer · Schwäbisch Gmünd, DE
• Fraser Morrison · Brechin, GB

Key dates

• Filing date: Mar 31, 2006
• Grant date: Jul 20, 2010
• Expiry date: Jan 18, 2029

Classification

• Technology area (CPC G): Physics
• CPC primary: G02B17/0812
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

There is provided an optical element comprising an optical element body, a reflecting area and an optical passageway. The optical element body defines an axis of rotational symmetry. The reflecting area is disposed on the optical element body and adapted to be optically used in an exposure process. The optical passageway is arranged within the optical element body and allows light to pass the optical element body, the optical passageway being arranged eccentrically with respect to the axis of rotational symmetry.