Method for making an integrated circuit including vertical junction field effect transistors
US7763506B2 · kind B2 · utility
4Cited by
3References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 10, 2007 |
| Grant date | Jul 27, 2010 |
| Priority date | — |
| Expiry date | Sep 10, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D64/256
Abstract
A method for making an integrated circuit including vertical junction field effect transistors is disclosed. One embodiment creates a vertical junction field effect transistor using a fault-tolerant or alignment-tolerant production process. The device performance is not harmed, even if misalignments in consecutive semiconductor processing steps occur.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.