Coating compositions for photoresists
US7776506B2 · kind B2 · utility
9Cited by
0References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 8, 2007 |
| Grant date | Aug 17, 2010 |
| Priority date | — |
| Expiry date | Nov 14, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2041
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In one aspect, the present invention relates to coating compositions that comprise a resin component, wherein the predominant portion of the resin component comprising one or more resins that are at least substantially free of fluorine. Coating compositions of the invention are useful as photoresist overcoat layers, including in immersion lithography processing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.