Patent · US Active

Method for measuring precursor amounts in bubbler sources

US7781016B2 · kind B2 · utility

2Cited by

4References

21Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Ronald Stevens · San Ramon, US
Brendan McDougall · Livermore, US
Jacob Smith · Santa Clara, US
Garry K. Kwong · San Jose, US
Sandeep Nijhawan · Los Altos, US
Lori D. Washington · Union City, US

Key dates

Filing date	Aug 23, 2006
Grant date	Aug 24, 2010
Priority date	—
Expiry date	Jun 22, 2028

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C16/4482
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

Methods are disclosed of determining a fill level of a precursor in a bubbler. The bubbler is fluidicly coupled with a substrate processing chamber through a vapor-delivery system. The bubbler and vapor-delivery system are backfilled with a known dose of a backfill gas. A pressure and temperature of the backfill gas are determined, permitting a total volume for the backfill gas in the bubbler and vapor-delivery system to be determined by application of a gas law. The fill level of the precursor in the bubbler is determined as a difference between (1) a total volume of the bubbler and vapor-delivery system and (2) the determined total volume for the backfill gas.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.