Compositions and processes for immersion lithography
US7781141B2 · kind B2 · utility
4Cited by
2References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 1, 2005 |
| Grant date | Aug 24, 2010 |
| Priority date | — |
| Expiry date | Jul 1, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0046
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to barrier layer compositions that are applied above a photoresist composition for immersion lithography processing. In a further aspect, new methods are provided for immersion lithography processing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.