Alignment marker and lithographic apparatus and device manufacturing method using the same
US7781237B2 · kind B2 · utility
1Cited by
4References
25Claims
0Family size
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Key dates
| Filing date | Jun 8, 2005 |
| Grant date | Aug 24, 2010 |
| Priority date | — |
| Expiry date | Jun 8, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7088
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus includes a first support structure configured to support an element that has an alignment marker provided with at least one height difference. The apparatus also includes an alignment sensor comprising a light source that is configured to provide a light beam that illuminates the alignment marker; and at least one detector configured to detect the at least one height difference of the alignment marker by analyzing the light beam reflected by the alignment marker. Such an apparatus may be used to align of the element with respect to the first support structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.