Patent · US Active

Projection objective having a high aperture and a planar end surface

US7782538B2 · kind B2 · utility

0Cited by

94References

9Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Susanne Beder · Aalen, DE
Wolfgang Singer · Aalen, DE
Karl-Heinz Schuster · Oberkochen, DE

Key dates

Filing date	Nov 12, 2008
Grant date	Aug 24, 2010
Priority date	—
Expiry date	Nov 12, 2028

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70958
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index material with a refractive index n≧1.6 at the operating wavelength.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.