Patent · US Active

Hydrogen separation membrane, sputtering target for forming said hydrogen separation membrane, and manufacturing method thereof

US7789948B2 · kind B2 · utility

4Cited by
5References
17Claims
0Family size

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Key dates

Filing dateNov 4, 2005
Grant dateSep 7, 2010
Priority date
Expiry dateFeb 10, 2027

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S55/05
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

Provided is a hydrogen separation membrane characterized by comprising a structure obtained by sintering atomized powder having a composition of NixMyZr100-x-y (wherein M is Nb and/or Ta, 25≦x≦40, 25≦y≦40) and an average grain size of 50 μm or less. The prepared hydrogen separation membrane does not require the use of costly Pd metal, and can be used as a substitute for conventional high-cost bulk metallic glass obtained by quenching of molten metal. This hydrogen separation membrane is free from problems such as defects in the hydrogen separation membrane and unevenness of composition, has a uniform structure, and is capable of separating hydrogen at low cost. Further provided are a sputtering target for forming such as hydrogen separation membrane and its manufacturing method.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.