Inventor · Ibaraki, JP

Masataka Yahagi

31Patents
7h-index
17Co-inventors
66Inventor score

Filing activity: Jun 26, 1998 → Feb 22, 2021

Most-cited inventions

PatentTitleAreaCited byStatus
US8148245B2 Method for producing a-IGZO oxide thin film Emerging Cross-Sectional Technologies 47 Active
US5939043A Process for preparing Li.sub.x Mn.sub.2 O.sub.4 intercalation compounds Emerging Cross-Sectional Technologies 32 Expired
US7699965B2 Zinc oxide-based transparent conductor and sputtering target for forming the transparent conductor Emerging Cross-Sectional Technologies 14 Active
US7635440B2 Sputtering target, thin film for optical information recording medium and process for producing the same Emerging Cross-Sectional Technologies 14 Expired
US7217310B2 Metal powder for powder metallurgy and iron-based sintered compact Performing Operations; Transporting 12 Expired
US7279211B2 Sputtering target containing zinc sulfide as major component, optical recording medium on which phase change optical disk protective film containing zinc sulfide as major component is formed by using the target, and method for manufacturing the sputtering target Emerging Cross-Sectional Technologies 10 Expired
US7156964B2 Sputtering target for phase-change memory, film for phase change memory formed by using the target, and method for producing the target Electricity 10 Expired
US8728358B2 Sintered compact, amorphous film and crystalline film of composite oxide, and process for producing the films Chemistry; Metallurgy 7 Active
US7347969B2 Iron-based sintered compact and method for production thereof Emerging Cross-Sectional Technologies 7 Expired
US8430978B2 Sputtering target and method for production thereof Chemistry; Metallurgy 6 Expired
US8277694B2 Sintered compact of composite oxide, amorphous film of composite oxide, process for producing said film, crystalline film of composite oxide and process for producing said film Chemistry; Metallurgy 5 Active
US7718095B2 Sputtering target, thin film for optical information recording medium and process for producing the same Emerging Cross-Sectional Technologies 5 Active
US8007693B2 Zinc oxide based transparent electric conductor, sputtering target for forming of the conductor and process for producing the target Chemistry; Metallurgy 4 Active
US8882975B2 Sb-Te base alloy sinter sputtering target Physics 4 Active
US7484546B2 Sputtering target for phase-change memory, film for phase change memory formed by using the target, and method for producing the target Electricity 4 Active
US7344660B2 Sputtering target and process for producing the same Emerging Cross-Sectional Technologies 4 Expired
US7789948B2 Hydrogen separation membrane, sputtering target for forming said hydrogen separation membrane, and manufacturing method thereof Emerging Cross-Sectional Technologies 4 Active
US8758497B2 Sputtering target of sintered Ti—Nb based oxide, thin film of Ti—Nb based oxide, and method of producing the thin film Physics 3 Active
US8252206B2 Amorphous film of composite oxide, crystalline film of composite oxide, method of producing said films and sintered compact of composite oxide Chemistry; Metallurgy 3 Active
US7897068B2 Sputtering target, thin film for optical information recording medium and process for producing the same Emerging Cross-Sectional Technologies 3 Active
US7727639B2 Iron-based sintered compact and method for production thereof Emerging Cross-Sectional Technologies 2 Active
US7691172B2 Metallic powder for powder metallurgy whose main component is iron and iron-based sintered body Performing Operations; Transporting 2 Expired
US7666245B2 Metallic powder for powder metallurgy whose main component is iron and iron-based sintered body Performing Operations; Transporting 2 Active
US7892457B2 Sputtering target, thin film for optical information recording medium and process for producing the same Emerging Cross-Sectional Technologies 1 Active
US8501052B2 Thin film comprising titanium oxide as main component and sintered compact sputtering target comprising titanium oxide as main component Chemistry; Metallurgy 1 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.