Patent · US Active

Optical inspection apparatus for substrate defect detection

US7796807B2 · kind B2 · utility

8Cited by

6References

9Claims

0Family size

Assignee

Applied Materials Israel Ltd. · IL

Inventors

David Alumot · Rehovot, IL
Gad Neumann · Rehovot, IL
Rivka Sherman · Ramat HaSharon, IL
Ehud Tirosh · Nes Ziona, IL

Key dates

Filing date	Jan 15, 2009
Grant date	Sep 14, 2010
Priority date	—
Expiry date	Jan 15, 2029

Classification

Technology area (CPC G)Physics
CPC primaryG01N2021/887
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A method and apparatus for inspecting the surface of articles, such as chips and wafers, for defects, includes a first phase of optically examining the complete surface of the article inspected at a relatively high speed and with a relatively low spatial resolution, and a second phase of optically examining with a relatively high spatial resolution only the suspected locations for the presence or absence of a defect therein.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.