Internal pressure controller of chamber and internal pressure subject-to-control type chamber
US7798167B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Apr 6, 2006 |
| Grant date | Sep 21, 2010 |
| Priority date | — |
| Expiry date | Feb 5, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/87507
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
A gas supply facility includes a plurality of pressure type flow controllers connected in parallel, and a first controller to control operation of the plurality of pressure type flow controllers so as to supply a desired gas exhausted by a vacuum pump to a chamber while controlling its flow rate, one of the pressure type flow controllers operates as a second controller to control the gas flow rate range up to 10% of the maximum flow rate supplied to the chamber, while the remaining pressure type flow controllers are made to be ones that control the rest of the gas flow rate range. Furthermore, pressure inside the chamber is controlled by installing a pressure detector in the chamber, inputting the value detected by the detector to the controller, and by adjusting a control signal to the pressure type flow controllers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.