Lithographic apparatus and device manufacturing method having liquid evaporation control
US7804575B2 · kind B2 · utility
16Cited by
27References
44Claims
0Family size
Assignee
Inventors
- Theodorus Petrus Maria Cadee
- Johannes Henricus Wilhelmus Jacobs
- Nicolaas Ten Kate
- Erik Roelof Loopstra
- Aschwin Lodewijk Hendricus Johannes Vermeer
- Jeroen Johannes Sophia Maria Mertens
- Christianus Gerardus Maria De Mol
- Marcel Johannus Elisabeth Hubertus Muitjens
- Antonius Johannus Van Der Net
- Joost Jeroen Ottens
- Johannes Anna Quaedackers
- Maria Elisabeth Reuhman-Huisken
- Marco Koert Stavenga
- Patricius Aloysius Jacobus Tinnemans
- Martinus Cornelis Maria Verhagen
- Jacobus Johannus Leonardus Hendricus Verspay
- Frederik Eduard De Jong
- Koen Goorman
- Boris Menchtchikov
- Herman Boom
- Stoyan Nihtianov
- Richard Moerman
- Martin Frans Pierre Smeets
- Bart Leonard Peter Schoondermark
- Franciscus Johannes Joseph Janssen
- Michel Riepen
Key dates
| Filing date | Aug 17, 2005 |
| Grant date | Sep 28, 2010 |
| Priority date | — |
| Expiry date | Aug 17, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70875
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.