Lithographic apparatus
US7804577B2 · kind B2 · utility
18Cited by
17References
44Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 29, 2006 |
| Grant date | Sep 28, 2010 |
| Priority date | — |
| Expiry date | May 16, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70866
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and below the plate between the plate and the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.