Coating and developing apparatus, coating and developing method and storage medium in which a computer-readable program is stored
US7809460B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 8, 2006 |
| Grant date | Oct 5, 2010 |
| Priority date | — |
| Expiry date | Aug 3, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67276
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A coating and developing apparatus comprises a washing section for washing the surface of a substrate after it has been subjected to a dipping exposure process in an exposing apparatus, and a first substrate carrying means adapted to transfer the substrate carried out from the exposing apparatus after the dipping exposure process to the washing section. The first substrate carrying means is controlled by a control means. Namely, the control means controls the first substrate carrying means such that the substrate can be washed in the washing section in a period of time prior to a time zone in which the size of liquid drops remaining on the substrate due to the dipping exposure process becomes smaller quite rapidly, based on a carrying-out ready signal for the substrate from the exposing apparatus, by using a relationship between the time elapsed from the end of the dipping exposure process and the size of liquid drops remaining on the substrate due to the dipping exposure process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.