Patent · US Active

Method of determining the depth profile of a surface structure and system for determining the depth profile of a surface structure

US7812966B2 · kind B2 · utility

15Cited by

6References

19Claims

0Family size

Assignee

Infineon Technologies AG · DE

Inventors

Frank Hoffmann · Wheaton, US
Knut Voigtlaender · Dresden, DE

Key dates

Filing date	Aug 30, 2007
Grant date	Oct 12, 2010
Priority date	—
Expiry date	May 16, 2028

Classification

Technology area (CPC G)Physics
CPC primaryG01B11/24
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

According to one embodiment of the present invention, a method of determining the depth profile of a surface structure includes: irradiating the surface structure with irradiation light including light components of different wavelengths; and determining the depth profile of the surface structure in dependence on interferometric effects caused by the reflection of the irradiation light at the surface structure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.