Method, program product and apparatus for obtaining short-range flare model parameters for lithography simulation tool
US7818151B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 2, 2006 |
| Grant date | Oct 19, 2010 |
| Priority date | — |
| Expiry date | Mar 10, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/705
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process of obtaining short-range flare model parameters representing a short-range flare which degrades a contrast of an image generated by a lithography tool, is disclosed. Short-range flare is measured from the image to obtain measured short-range flare data. A simulation is performed based on short-range flare model parameters to obtain simulated short-range flare data. The simulated short-range flare data is compared with the measured short range flare data. It is determined whether the short-range flare model parameters used in the simulation is appropriate based on the comparison result. The short-range flare model parameters is optimized according to the measured short-range data and the simulated short-range flare data if the short-range flare model parameters used for the simulation is not appropriate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.