Methods for performing actual flow verification
US7822570B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 9, 2007 |
| Grant date | Oct 26, 2010 |
| Priority date | — |
| Expiry date | May 15, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/7722
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for determining an actual gas flow rate in a reaction chamber of a plasma processing system is provided. The method includes delivering gas by a gas flow delivery system controlled by a mass flow controller (MFC) to an orifice, which is located upstream from the reaction chamber. The method also includes pressurizing the gas to create a choked flow condition within the orifice. The method further includes measuring a set of upstream pressure values of the gas via a set of pressure sensors. The method yet also includes applying a calibration factor of a set of calibration factors to determine the actual flow rate. The calibration factor is a ratio of an average of the set of upstream pressure values to an average of a set of golden upstream pressure values, which is associated with an indicated flow rate for an MFC.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.