Circulation system for high refractive index liquid in pattern forming apparatus
US7826032B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 16, 2007 |
| Grant date | Nov 2, 2010 |
| Priority date | — |
| Expiry date | Nov 2, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/908
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A circulation system for a high refractive index liquid includes a first collecting section configured to collect a high refractive index liquid used in an immersion light exposure section; a first supply section configured to supply the high refractive index liquid collected in the first collecting section to a cleaning section as a cleaning liquid; a second collecting section configured to collect the high refractive index liquid used in the cleaning section; and a second supply section configured to supply the high refractive index liquid collected in the second collecting section to the immersion light exposure section, wherein the high refractive index liquid is circulated between the immersion light exposure section and the cleaning section.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.