Dual tone development with plural photo-acid generators in lithographic applications
US7829269B1 · kind B1 · utility
19Cited by
20References
13Claims
0Family size
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Key dates
| Filing date | Sep 22, 2009 |
| Grant date | Nov 9, 2010 |
| Priority date | — |
| Expiry date | Sep 22, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70466
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and system for patterning a substrate using a dual tone development process is described. The method comprises use of plural photo-acid generators with or without a flood exposure of the substrate to improve process latitude for the dual tone development process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.