Steven Scheer
25Patents
7h-index
21Co-inventors
65Inventor score
Filing activity: Jun 30, 2004 → Jul 9, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7673278B2 | Enhanced process yield using a hot-spot library | Electricity | 22 | Active |
| US7829269B1 | Dual tone development with plural photo-acid generators in lithographic applications | Physics | 19 | Active |
| US8097402B2 | Using electric-field directed post-exposure bake for double-patterning (D-P) | Electricity | 19 | Active |
| US8288174B1 | Electrostatic post exposure bake apparatus and method | Electricity | 12 | Active |
| US8129080B2 | Variable resist protecting groups | Physics | 10 | Active |
| US10020195B2 | Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists | Electricity | 7 | Active |
| US7588879B2 | Graded spin-on organic antireflective coating for photolithography | Emerging Cross-Sectional Technologies | 7 | Active |
| US8795952B2 | Line pattern collapse mitigation through gap-fill material application | Physics | 6 | Active |
| US7483804B2 | Method of real time dynamic CD control | Physics | 5 | Active |
| US8197996B2 | Dual tone development processes | Physics | 5 | Active |
| US7816069B2 | Graded spin-on organic antireflective coating for photolithography | Emerging Cross-Sectional Technologies | 4 | Active |
| US8283111B2 | Method for creating gray-scale features for dual tone development processes | Physics | 3 | Active |
| US9454081B2 | Line pattern collapse mitigation through gap-fill material application | Physics | 3 | Active |
| US9085045B2 | Method and system for controlling a spike anneal process | Electricity | 3 | Active |
| US8449293B2 | Substrate treatment to reduce pattern roughness | Physics | 2 | Active |
| US8574810B2 | Dual tone development with a photo-activated acid enhancement component in lithographic applications | Physics | 2 | Active |
| US8257911B2 | Method of process optimization for dual tone development | Physics | 1 | Active |
| US7267863B2 | Film stack having under layer for preventing pinhole defects | Emerging Cross-Sectional Technologies | 1 | Expired |
| US7473461B2 | Film stack having under layer for preventing pinhole defects | Emerging Cross-Sectional Technologies | 0 | Active |
| US9383138B2 | Methods and heat treatment apparatus for uniformly heating a substrate during a bake process | Mechanical Engineering; Lighting; Heating | 0 | Active |
| US7541065B2 | Method of forming film stack having under layer for preventing pinhole defects | Emerging Cross-Sectional Technologies | 0 | Active |
| US7632631B2 | Method of preventing pinhole defects through co-polymerization | Emerging Cross-Sectional Technologies | 0 | Active |
| US8568964B2 | Flood exposure process for dual tone development in lithographic applications | Physics | 0 | Active |
| US12165870B2 | Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists | Electricity | 0 | Active |
| US7132316B2 | After deposition method of thinning film to reduce pinhole defects | Electricity | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.