Projection objective of a microlithographic projection exposure apparatus

US7830611B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Olaf Conradi · Sonthofen, DE
• Sascha Bleidistel · Aalen, DE
• Markus Hauf · Ulm, DE
• Wolfgang Hummel · Dresden, DE
• Arif Kazi · Aalen, DE
• Baerbel Schwaer · Aalen, DE
• Jochen Weber · Laufenbürg, DE
• Hubert Holderer · Oberkochen, DE
• Payam Tayebati · Ulm, DE
• Boris Bittner · Roth, DE

Key dates

• Filing date: Jan 9, 2008
• Grant date: Nov 9, 2010
• Expiry date: Jul 10, 2028

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70825
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.