Olaf Conradi
19Patents
3h-index
40Co-inventors
56Inventor score
Filing activity: May 24, 2006 → Jan 24, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7830611B2 | Projection objective of a microlithographic projection exposure apparatus | Physics | 17 | Active |
| US9442381B2 | Method of operating a projection exposure tool for microlithography | Physics | 4 | Active |
| US7990622B2 | Projection objective of a microlithographic projection exposure apparatus | Physics | 3 | Active |
| US9146475B2 | Projection exposure system and projection exposure method | Physics | 3 | Active |
| US8462315B2 | Optical system and method of use | Physics | 2 | Active |
| US7777963B2 | Method for improving the imaging properties of a projection objective, and such a projection objective | Emerging Cross-Sectional Technologies | 2 | Expired |
| US8947633B2 | Optical system and method of use | Physics | 1 | Active |
| US9069263B2 | Method for improving the imaging properties of a projection objective, and such a projection objective | Emerging Cross-Sectional Technologies | 1 | Active |
| US8325323B2 | Method and system for correcting image changes | Physics | 1 | Active |
| US9097984B2 | Microlithography projection objective | Physics | 1 | Active |
| US7808615B2 | Projection exposure apparatus and method for operating the same | Physics | 1 | Active |
| US10241423B2 | Method of operating a projection exposure tool for microlithography | Physics | 0 | Active |
| US9366977B2 | Semiconductor microlithography projection exposure apparatus | Physics | 0 | Active |
| US9581813B2 | Method for improving the imaging properties of a projection objective, and such a projection objective | Emerging Cross-Sectional Technologies | 0 | Active |
| US10281824B2 | Microlithography projection objective | Physics | 0 | Active |
| US9823579B2 | Optical system and method of use | Physics | 0 | Active |
| US9606446B2 | Reflective optical element for EUV lithography and method of manufacturing a reflective optical element | Physics | 0 | Active |
| US9690203B2 | Method for adjusting an illumination setting | Physics | 0 | Active |
| US8773638B2 | Microlithographic projection exposure apparatus with correction optical system that heats projection objective element | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.