Multi-chamber gas discharge laser bandwidth control through discharge timing
US7830934B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 29, 2005 |
| Grant date | Nov 9, 2010 |
| Priority date | — |
| Expiry date | Mar 12, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/09702
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and apparatus are disclosed for controlling bandwidth in a multi-portion laser system comprising a first line narrowed oscillator laser system portion providing a line narrowed seed pulse to an amplifier laser system portion, may comprise utilizing a timing difference curve defining a relationship between a first laser system operating parameter other than bandwidth and the timing difference and also a desired point on the curve defining a desired timing difference, wherein each unique operating point on the curve corresponds to a respective bandwidth value; determining an actual offset from the timing difference at the desired point on the curve to an actual operating point on the curve; determining an error between the actual offset and a desired offset corresponding to a desired bandwidth; modifying the firing differential timing to remove the error between the actual offset and the desired offset.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.