Patent · US Active

Measurement and control of strained devices

US7838309B1 · kind B1 · utility

2Cited by
4References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 27, 2008
Grant dateNov 23, 2010
Priority date
Expiry dateAug 27, 2028

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01B2210/56
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method that includes measuring stress on at least one of a monitor substrate, a production substrate, and a proxy device on a production substrate to produce stress data, measuring shape on at least one of a proxy device on a production substrate and a production device on a production substrate to produce shape data, and inputting the stress data and the shape data into an elastic deformation calculation to determine a stress value for a production device.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.