Temperature controlled substrate holder having erosion resistant insulating layer for a substrate processing system
US7838800B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 25, 2006 |
| Grant date | Nov 23, 2010 |
| Priority date | — |
| Expiry date | Feb 20, 2027 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF27D19/00
- WIPO fieldThermal processes and apparatus
- WIPO sectorMechanical engineering
Abstract
A substrate holder for supporting a substrate in a processing system includes a temperature controlled support base having a first temperature, a substrate support opposing the temperature controlled support base and configured to support the substrate, and one or more heating elements coupled to the substrate support and configured to heat the substrate support to a second temperature above the first temperature. An erosion resistant thermal insulator disposed between the temperature controlled support base and the substrate support, wherein the erosion resistant thermal insulator includes a material composition configured to resist halogen-containing gas corrosion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.