Apparatus and method for e-beam dark imaging with perspective control
US7838833B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 30, 2007 |
| Grant date | Nov 23, 2010 |
| Priority date | — |
| Expiry date | Jan 27, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2804
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of imaging using an electron beam. An incident electron beam is focused onto the specimen surface, a scattered electron beam is extracted from the specimen surface, and a plurality of dark field signals are detected using a detection system. An interpolated dark field signal is generated using the plurality of dark field signals. In addition, a bright field signal may be detected using the detection system, and a final interpolated signal may be generated using the interpolated dark field signal and the bright field signal. User input may be received which determines a degree of interpolation between two adjacent dark field signals so as to generate the interpolated dark field signal and which determines an amount of interpolation between the interpolated dark field signal and the bright field signal so as to generate a final interpolated signal. Other embodiments, aspects and features are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.