Ion implanters
US7838849B2 · kind B2 · utility
7Cited by
3References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 24, 2007 |
| Grant date | Nov 23, 2010 |
| Priority date | — |
| Expiry date | Oct 6, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/022
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The present invention relates to components in ion implanters having surfaces, such as graphite surfaces, adjacent to the path of the ion beam through the ion implanter. Such surfaces will be prone to sputtering, and sputtered material may become entrained in the ion beam. The present invention sees the use of surfaces that are formed so as to present a series of angled faces that meet at sharp intersections. In this way, any material will be sputtered away from the ion beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.