Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
US7841352B2 · kind B2 · utility
5Cited by
43References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 29, 2007 |
| Grant date | Nov 30, 2010 |
| Priority date | — |
| Expiry date | Apr 27, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic transducer, a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned, and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.