Methods and systems of performing device failure analysis, electrical characterization and physical characterization
US7842920B2 · kind B2 · utility
11Cited by
6References
24Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 14, 2007 |
| Grant date | Nov 30, 2010 |
| Priority date | — |
| Expiry date | Nov 12, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01Q30/20
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An analysis system has a charged particle beam instrument and a scanning probe microscope operably coupled with the charged particle beam instrument. A stage defines an aperture, the stage is adapted to support the sample over the aperture and finely move the sample at least along an X and Y axis, the aperture further situated in an operable area of the charged particle beam. The charged particle beam is used to mill the sample, while the scanning probe microscope is used to measure elements exposed by the milling.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.