Extreme ultra violet light source apparatus
US7842937B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Feb 20, 2008 |
| Grant date | Nov 30, 2010 |
| Priority date | — |
| Expiry date | Nov 23, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S5/4012
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An extreme ultra violet light source apparatus by which EUV light can be efficiently obtained uses a driver laser which can realize a desired pulse width with substantially homogeneous intensity. The apparatus generates extreme ultra violet light by applying a laser beam to a target, and includes a chamber in which extreme ultra violet light is generated; a target supply unit which supplies a liquid or solid metal target to a predetermined position within the chamber; a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate a single pulse laser beam or a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by the target supply unit to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputs it.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.