Lithographic apparatus, device manufacturing method, and mask having a pellicle attached hereto
US7843552B2 · kind B2 · utility
4Cited by
4References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 17, 2005 |
| Grant date | Nov 30, 2010 |
| Priority date | — |
| Expiry date | Sep 12, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70983
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The mechanical properties of a pellicle frame and/or the pellicle are optimized so that the mechanical effect of the frame and pellicle on the mask shape in use is optimum for imaging. In particular the pellicle frame assembly may be arranged to be mechanically neutral, i.e., the mask adopts the same shape with pellicle attached as it would without the pellicle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.