Environment friendly methods and systems for template cleaning and reclaiming in imprint lithography technology
US7846266B1 · kind B1 · utility
6Cited by
4References
17Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 17, 2006 |
| Grant date | Dec 7, 2010 |
| Priority date | — |
| Expiry date | Oct 9, 2029 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/42
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Cleaning and reclaiming nano-imprint templates using environment friendly methods and systems is disclosed. A template may be cleaned by a combination of exposure to activated gaseous species followed by rinsing with oxygenated or hydrogenated DI water and exposure to reactive plasma to remove organic contaminant. Contaminant may be removed by forming a coating film of a water soluble polymer on the template and then peeling off the coating film. Organic residue from the film may be removed using oxygenated plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.